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Proceedings Paper

Measurement of thin film shape with a sinusoidal wavelength scanning interferometer using a white light source
Author(s): Osami Sasaki; Hiroshi Ueno; Takamasa Suzuki
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Paper Abstract

A halogen lamp and an acousto-optic tunable filter are used to construct a sinusoidal wavelength-scanning interferometer with the scanning width of 210 nm. A linear wavelength-scanning with the scanning width of 220 nm is utilized to determine amplitudes of three different interference signals produced from multiple-reflection lights by front and rear surfaces of a thin film. Amplitudes of time-varying phases produced by a sinusoidal wavelength-scanning and constant phases in the interference signals are estimated by minimizing a difference between detected signals and theoretical ones. From the estimated values, the positions of the front and rear surface of the thin film with a thickness of about 460 nm are measured with an error less than 4 nm.

Paper Details

Date Published: 20 November 2009
PDF: 7 pages
Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110B (20 November 2009); doi: 10.1117/12.840190
Show Author Affiliations
Osami Sasaki, Niigata Univ. (Japan)
Hiroshi Ueno, Niigata Univ. (Japan)
Takamasa Suzuki, Niigata Univ. (Japan)


Published in SPIE Proceedings Vol. 7511:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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