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Proceedings Paper

Implementation of double patterning process toward 22-nm node
Author(s): Hidetami Yaegashi; Eiichi Nisimura; Kazuhide Hasebe; Tetsu Kawasaki; Masato Kushibiki; Arisa Hara; Shoichi Yamauchi; Sakurako Natori; Nakajima Shigeru; Hiroki Murakami; Kazuo Yabe; Satoru Shimura; Fumiko Iwao; Kenichi Oyama
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Paper Abstract

In the field of photolithography, a variety of resolution enhancement techniques (RETs) are being applied under the mainstream technology of 193-mm water-based immersion lithography. The resolution performance of photoresist, however, is limited at 40 nm. Double patterning (DP) is considered to be an effective technology for overcoming this limiting resolution. Many double-patterning techniques have come to be researched such as litho-etch-litho-etch (LELE), litho-litho-etch (LLE), and self-aligned spacer DP, but as the pattern-splitting type of double patterning requires high overlay accuracy in exposure equipment, the self-aligned type of double patterning has become the main approach. This paper introduces the research results of various double-patterning techniques toward 22nm nodes and touches upon newly developed elemental technologies for double patterning.

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 75201E (11 December 2009); doi: 10.1117/12.839826
Show Author Affiliations
Hidetami Yaegashi, Tokyo Electron Ltd. (Japan)
Eiichi Nisimura, Tokyo Electron AT Ltd. (Japan)
Kazuhide Hasebe, Tokyo Electron Tohoku Ltd. (Japan)
Tetsu Kawasaki, Tokyo Electron Kyushu Ltd. (Japan)
Masato Kushibiki, Tokyo Electron AT Ltd. (Japan)
Arisa Hara, Tokyo Electron Ltd. (Japan)
Shoichi Yamauchi, Tokyo Electron Ltd. (Japan)
Sakurako Natori, Tokyo Electron Ltd. (Japan)
Nakajima Shigeru, Tokyo Electron Tohoku Ltd. (Japan)
Hiroki Murakami, Tokyo Electron Tohoku Ltd. (Japan)
Kazuo Yabe, Tokyo Electron Ltd. (Japan)
Satoru Shimura, Tokyo Electron Kyushu Ltd. (Japan)
Fumiko Iwao, Tokyo Electron Kyushu Ltd. (Japan)
Kenichi Oyama, Tokyo Electron Ltd. (Japan)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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