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Proceedings Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing
Author(s): Slava Rokitski; Toshi Ishihara; Rajeskar Rao; Rui Jiang; Daniel Riggs; Mary Haviland; Theodore Cacouris; Daniel Brown
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Paper Abstract

The ability to extend deep ultraviolet (DUV) lithography into the 32 and sub-32nm domain has more recently relied on improvements in source-mask optimization (SMO), double patterning (DP) and complex, pixellated illumination patterns. Yet these techniques require a commensurate improvement in the light source that powers the latest generation scanners in order to enable high performance at high throughput. This paper will show detailed performance results of the latest-generation light source from Cymer that incorporates flexible power with dramatic improvements in dose, wavelength and bandwidth stability.

Paper Details

Date Published: 11 December 2009
PDF: 7 pages
Proc. SPIE 7520, Lithography Asia 2009, 752013 (11 December 2009); doi: 10.1117/12.839803
Show Author Affiliations
Slava Rokitski, Cymer, Inc. (United States)
Toshi Ishihara, Cymer, Inc. (United States)
Rajeskar Rao, Cymer, Inc. (United States)
Rui Jiang, Cymer, Inc. (United States)
Daniel Riggs, Cymer, Inc. (United States)
Mary Haviland, Cymer, Inc. (United States)
Theodore Cacouris, Cymer, Inc. (United States)
Daniel Brown, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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