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Proceedings Paper

Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide
Author(s): K. Ghoumid; R. Ferriere; B.-E. Benkelfat; G. Ulliac; R. Salut; J.-Y. Rauch; T. Gharbi
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Paper Abstract

In this paper we have studied effect of depth etching on the Bragg gratings (BGs) realized by Focused Ions Beam. This technique has the advantage to induce a direct waveguide structuring without intermediate media, comparing to traditional methods. A reflectivity of 96% within a window centred at 1550 nm is obtained. The effect of the depth etching on the transmittance and the bandwidth at half maximum is demonstrated.

Paper Details

Date Published: 5 August 2009
PDF: 6 pages
Proc. SPIE 7386, Photonics North 2009, 738613 (5 August 2009); doi: 10.1117/12.839692
Show Author Affiliations
K. Ghoumid, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)
R. Ferriere, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)
B.-E. Benkelfat, Institut Telecom, Telecom & Management SudParis, CNRS (France)
G. Ulliac, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)
R. Salut, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)
J.-Y. Rauch, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)
T. Gharbi, Institut Femto-ST, CNRS, Univ. de Franche-Comte (France)


Published in SPIE Proceedings Vol. 7386:
Photonics North 2009
Réal Vallée, Editor(s)

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