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Proceedings Paper

The synthesis and imaging study of a series of novel photoactive polymers with diazoketo groups in their side chains
Author(s): Lu Liu; Yingquan Zou; Yuchun Yang; Yong Huang; Qisheng Liu; Huinan Niu
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Paper Abstract

A kind of photoactive polymer with diazoketo groups in its side chains has been reported in SPIE and other related papers, and this photoactive polymer can be used in deep UV non-CARs (non-chemically amplified resists) system. Based on the work above, a series of novel photoactive monomers with substituents like phenyl, p-methylphenyl, p-methoxyphenyl, p-dimethylaminophenyl on the end of the molecule are designed and synthesized. By changing their substituents, the maximum-absorption wavelength of the photoactive monomers has been moved to 356nm, and it still has comparatively large absorption at 365nm (I-line). A series of photoactive polymers were obtained by polymerizing the monomer with methyl methacrylate and 2-hydroxyethyl methacrylate together. Upon irradiaton in the waveleng of 365nm, the diazoketo groups which are in the side chains of the photoactive polymers undergo the wolff rearrangment and afford ketens that react with water to provide base-soluble photoproducts. Applying this kind of photoactive polymers to non-CARs, a positive image can be obtained. This kind of photoactive polymers have great value in I-line non-CARs, TFT-LCD and IC discrete devices processing. And its anti-dry etching ability is enhanced by the introduction of the benzene ring.

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 75201R (11 December 2009); doi: 10.1117/12.839549
Show Author Affiliations
Lu Liu, Beijing Normal Univ. (China)
Yingquan Zou, Beijing Normal Univ. (China)
Yuchun Yang, Beijing Normal Univ. (China)
Yong Huang, Beijing Normal Univ. (China)
Qisheng Liu, Beijing Normal Univ. (China)
Huinan Niu, Beijing Normal Univ. (China)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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