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Proceedings Paper

Development and evaluation of new MRC parameter for aggressive mask optimization
Author(s): Seong-bo Shim; Young-chang Kim; Seong-hoon Jang; Hee-bom Kim; Sung-woo Lee; Seong-woon Choi; Han-ku Cho; Chan-hoon Park
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Paper Abstract

As the design node gets smaller, using the aggressive mask optimization becomes indispensable emerging technology. However, during the aggressive optimization, we have frequently met problems that the optimized feature size gets smaller as Mask manufacturing Rule Checking (MRC) limitation. In this case, process window cannot improve more. Moreover, mask drawing error could be significant when the optimized main feature is as small as MRC limitation. As a solution for this problem, we have generally tried to develop the advanced mask manufacturing process. However, nowadays, it is truly not easy to improve the mask resolution. In this study, we found out the fact that the current MRC parameters are not good enough to reflect the mask patterning limitation. Thus, many small patterns have been eliminated by the MRC during the optimization, even though the patterns could be drawn well on the mask. In this paper, we suggest more effective MRC parameter; area based MRC. We introduce the evaluation result that represents the actual coverage of MRC. It proves that the area based MRC can reflect the mask process limitation much better than current MRC. Finally it is shown that the effect and utility of the area based MRC on the practical case by using inverse lithography technology (ILT).

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200U (11 December 2009); doi: 10.1117/12.839398
Show Author Affiliations
Seong-bo Shim, Samsung Electronics Co., Ltd. (Korea, Republic of)
Young-chang Kim, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seong-hoon Jang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Hee-bom Kim, Samsung Electronics Co., Ltd. (Korea, Republic of)
Sung-woo Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seong-woon Choi, Samsung Electronics Co., Ltd. (Korea, Republic of)
Han-ku Cho, Samsung Electronics Co., Ltd. (Korea, Republic of)
Chan-hoon Park, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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