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Proceedings Paper

Preparing and internal friction of VOx/TiOx/Ti multilayer thin films
Author(s): H. Q. Li; X. X. He; G. Z. Fang; L. F. Shao
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Paper Abstract

VOx/TiOx/Ti multilayer thin films were deposited on glass and molybdenum substrates by magnetron reactive sputtering. The structure and properties of thin films were measured with X-ray diffraction (XRD), QJ31 Wheatstone Bridge and the internal friction instrument. Preparing process and internal friction of VOx/TiOx/Ti multilayer thin films were studied respectively. On the basis of measurement analysis from crystal structure, the curves of resistance vs temperature, and Young's modulus vs temperature, the phase transformation of VOx multilayer thin film occurs at 66°C and its temperature coefficient of resistance is - 4.35%/°C.

Paper Details

Date Published: 23 November 2009
PDF: 8 pages
Proc. SPIE 7508, 2009 International Conference on Optical Instruments and Technology: Advanced Sensor Technologies and Applications, 75081E (23 November 2009); doi: 10.1117/12.838162
Show Author Affiliations
H. Q. Li, Hefei Univ. of Technology (China)
X. X. He, Hefei Univ. of Technology (China)
G. Z. Fang, Hefei Univ. of Technology (China)
L. F. Shao, Hefei Univ. of Technology (China)


Published in SPIE Proceedings Vol. 7508:
2009 International Conference on Optical Instruments and Technology: Advanced Sensor Technologies and Applications
YanBiao Liao; Anbo Wang; Tingyun Wang; Yukihiro Ishii, Editor(s)

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