Share Email Print
cover

Proceedings Paper

On-line measurement of profile parameters of rectangular holographic photoresist gratings during development
Author(s): Shiming Wei; Lifeng Li
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This paper presents a method for on-line measuring photoresist grating profiles during the development process by detecting the diffraction efficiencies of surface-relief photoresist gratings on transparent substrates. A He-Ne laser of 594.1 nm wavelength is employed as the monitoring light source. Firstly, the groove depth of a grating is determined from the minimum value of the monitoring curve of the 0th-order transmission intensity. Then, with the groove depth known, the duty cycle of the grating is measured from the -1st-order transmission intensity. The feasibility of our method has been demonstrated through fabrication of many rectangular photoresist gratings of 1200, 2200, and 3000 lines/mm on glass substrates. Good agreement between the on-line, real-time measured results and the scanning electron microscopy results is obtained.

Paper Details

Date Published: 20 November 2009
PDF: 9 pages
Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110J (20 November 2009); doi: 10.1117/12.837778
Show Author Affiliations
Shiming Wei, Tsinghua Univ. (China)
Lifeng Li, Tsinghua Univ. (China)


Published in SPIE Proceedings Vol. 7511:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

© SPIE. Terms of Use
Back to Top