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Proceedings Paper

Influence of partially coherent illumination on aerial-image-based aberration measurement of projection optics in lithographic tools
Author(s): Tingting Zhou; Shiyuan Liu; Wei Liu; Lijuan Wang
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Paper Abstract

In this paper, the aberration measurement technique using aerial image sensor (AIS) is further derived, and the influence of partially coherent illumination on the performance of this technique is analyzed comprehensively in practice. The AIS based technique detects the intensity of the aerial image to obtain the wavefront aberration on each sampling point of the exit pupil using a set of 36 binary gratings with different pitches and orientations. The simulation work conducted by the lithographic simulator PROLITH has demonstrated that the aberration measurement errors grow with the partial coherent factor increasing. Two effects of the partially coherent illumination are proposed to interpret such influence that causes the measurement errors.

Paper Details

Date Published: 20 November 2009
PDF: 10 pages
Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 751104 (20 November 2009); doi: 10.1117/12.837770
Show Author Affiliations
Tingting Zhou, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Wei Liu, Huazhong Univ. of Science and Technology (China)
Lijuan Wang, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7511:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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