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Proceedings Paper

Design and tolerance analysis of compensator for high order aspheric surface testing
Author(s): Xu Chen; Weiqi Liu
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Paper Abstract

High accuracy is required in surface testing of 90nm nodal point lithography projecting lens. By comparing various aspheric surface testing methods, we adopt Offner null compensator to test the aspheric surface in the point diffraction interferometer at last. In this paper, an Offner compensator is presented on the base of the third order aberration theory to test concave aspheric surface, the optical construction parameters of which is determined by introducing equal-quantities spherical aberration to compensate all orders of aspheric coefficients. The field of view of the system is 0.02º; the structure layout of the compensator is a meniscus positive lens combined with a Plano-convex positive lens. The design results indicate that: primary and high order aberrations are balanced well, MTF exceeds diffraction limit, root-mean-square (RMS) of wave front error <λ/167. The F-number of the system can achieve F/1.64. By the analysis of the process of aspheric surface testing with the designed system, a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus.

Paper Details

Date Published: 20 November 2009
PDF: 8 pages
Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 751119 (20 November 2009); doi: 10.1117/12.837750
Show Author Affiliations
Xu Chen, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of CAS (China)
Weiqi Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7511:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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