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Analysis of thickness uniformity of optical thin film by magnetron sputtering system with planetary circumrotation
Author(s): Tao Wang; He Yu
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Proc. SPIE 7509, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, ; doi: 10.1117/12.837697
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Tao Wang, the State Key Laboratory of Electronic Thin Films and Integrated Devices, UESTC. (China)
He Yu, the State Key Laboratory of Electronic Thin Films and Integrated Devices, UESTC. (China)


Published in SPIE Proceedings Vol. 7509:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration

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