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Proceedings Paper

Investigations on titanium oxide film as an alternative heat sensitive material
Author(s): Jing Jiang; Zhiming Wu; Yadong Jiang; Tao Wang; He Yu
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Paper Abstract

In this article, substoichiometric titanium oxide thin films (TiOX) are prepared with the reactive DC sputtering in an oxygen and argon atmosphere and then annealed in an oxygen atmosphere. Under a set of optimum deposition parameters, TiOX film with sheet resistance value of 167.9 KΩ/(box) and TCR value of -3.30%/K obtained. Transmittance of the optimum film is obtained in the 300≤λ≤1100nm wavelength range at room temperature. Thickness, near-infrared absorptance, and other properties of the optimum film are also investigated in this paper.

Paper Details

Date Published: 25 November 2009
PDF: 9 pages
Proc. SPIE 7513, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology, 751315 (25 November 2009); doi: 10.1117/12.837590
Show Author Affiliations
Jing Jiang, Univ. of Electronic Science and Technology of China (China)
Zhiming Wu, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)
Tao Wang, Univ. of Electronic Science and Technology of China (China)
He Yu, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7513:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology
Toru Yoshizawa; Ping Wei; Jesse Zheng, Editor(s)

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