Share Email Print
cover

Proceedings Paper

Processing technology of interferogram for thin film thickness measurement
Author(s): Jun-hong Su; Jin-man Ge
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Measuring the thin film thickness by modern interferometry has advantages of the whole test, high precision and non-contact measurement, the kernel of which is to obtain necessary surface shape and parameter by processing interferogram with reasonable algorithms. The pre-treatment of the interferogram is the most crucial and a basal part, which includes the edge identification of based on Mathematical Morphology, regional extension based on the 2-D FFT and unwrapped and wrapped phase based on the non-weighted least squares algorithm for DCT. At the result, surface distribution can be obtained, which lays the groundwork for getting the thin films thickness correctly. In this paper, the image collection of the SiO2 film and the pretreatment of interferogram is performed. The result indicates that it is basically consistent to the result tested by Zygo interferometer.

Paper Details

Date Published: 20 November 2009
PDF: 7 pages
Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 751113 (20 November 2009); doi: 10.1117/12.837583
Show Author Affiliations
Jun-hong Su, Xi'an Technological Univ. (China)
Jin-man Ge, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 7511:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

© SPIE. Terms of Use
Back to Top