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Proceedings Paper

Regularization of inverse photomask synthesis to enhance manufacturability
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Paper Abstract

Mask manufacturability has been considered as a major issue in the adoption of inverse lithography (IL) in practice. With smaller technology nodes, IL distorts the mask pattern more aggressively. The distorted mask often contains curvilinear contour and irregular shapes, which cast a heavy computation burden on segmentation and data preparation. Total variation (TV) has been used for regularization in previous work, but it is not very effective in regulating the mask shape to be rectangular. In this paper, we apply TV regularization not only on the mask image but also on the mask edges, which forces the curves of edges to be more vertical or horizontal, because they give smaller TV values. Except for rectilinearity, a group of geometrical specifications of the mask pattern set by mask manufacture rule control (MRC) is also important for mask manufacturability. To prevent these characteristics from appearing, we also propose an intervention scheme into the optimization framework.

Paper Details

Date Published: 11 December 2009
PDF: 11 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200E (11 December 2009); doi: 10.1117/12.837512
Show Author Affiliations
Ningning Jia, The Univ. of Hong Kong (Hong Kong, China)
Alfred K. Wong, Consultant (United States)
Edmund Y. Lam, The Univ. of Hong Kong (Hong Kong, China)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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