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Proceedings Paper

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography
Author(s): Victor Shih; Jacky Huang; Willie Wang; G. T. Huang; H. L. Chung; Alan Ho; W. T. Yang; Sophia Wang; Chih-Ming Ke; L. J. Chen; C. R. Liang; H. H. Liu; H. J. Lee; L. G. Terng; T. S. Gau; John Lin; Kaustuve Bhattacharyya; Maurits van der Schaar; Noelle Wright; Mir Shahrjerdy; Vivien Wang; Spencer Lin; Jon Wu; Sophie Peng; Dennis Chang; Cathy Wang; Andreas Fuchs; Omer Adam; Karel van der Mast
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Paper Abstract

Advanced lithography is becoming increasingly demanding when speed and sophistication in communication between litho and metrology (feedback control) are most crucial. Overall requirements are so extreme that all measures must be taken in order to meet them. This is directly driving the metrology resolution, precision and matching needs in to deep sub-nanometer level [4]. Keeping the above in mind, a new scatterometry-based platform is under development at ASML. Authors have already published results of a thorough investigation of this promising new metrology technique which showed excellent results on resolution, precision and matching for overlay, as well as basic and advanced capabilities for CD [1], [2], [3]. In this technical presentation the authors will report the newest results from this ASML platform. This new work was divided in two sections: monitor wafer applications (scanner control - overlay, CD and focus) and product wafer applications.

Paper Details

Date Published: 11 December 2009
PDF: 7 pages
Proc. SPIE 7520, Lithography Asia 2009, 75201A (11 December 2009); doi: 10.1117/12.837353
Show Author Affiliations
Victor Shih, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Jacky Huang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Willie Wang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
G. T. Huang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
H. L. Chung, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Alan Ho, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
W. T. Yang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Sophia Wang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Chih-Ming Ke, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
L. J. Chen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
C. R. Liang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
H. H. Liu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
H. J. Lee, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
L. G. Terng, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
T. S. Gau, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
John Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Kaustuve Bhattacharyya, ASML Netherlands B.V. (Netherlands)
Maurits van der Schaar, ASML Netherlands B.V. (Netherlands)
Noelle Wright, ASML Netherlands B.V. (Netherlands)
Mir Shahrjerdy, ASML Netherlands B.V. (Netherlands)
Vivien Wang, ASML Netherlands B.V. (Netherlands)
Spencer Lin, ASML Taiwan Ltd. (Taiwan)
Jon Wu, ASML Taiwan Ltd. (Taiwan)
Sophie Peng, ASML Taiwan Ltd. (Taiwan)
Dennis Chang, ASML Taiwan Ltd. (Taiwan)
Cathy Wang, ASML Taiwan Ltd. (Taiwan)
Andreas Fuchs, ASML Netherlands B.V. (Netherlands)
Omer Adam, ASML Netherlands B.V. (Netherlands)
Karel van der Mast, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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