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Proceedings Paper

EUV sensitive photo-acid generator sans chromophore
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Paper Abstract

Recent advances in EUVL lithography is mainly centered on improving the RLS trade-off by employing new resist platforms, bulkier PAGs, EUV sensitizers etc. Among the several new kinds of PAGs proposed till date, the focus of development was mainly on the acid strength, compatibility with resin etc., whilst always retaining the mono, Di or tri phenyl chromophore of the PAG. Herein we report on the use of chromophore-less PAG for the patterning of EUVL resists. Resist performance using model acrylate and PHS based resist was studied. The patterned resists were characterized using SEM. Thermal stability of the PAG was compared with model chromophore containing PAG.

Paper Details

Date Published: 11 December 2009
PDF: 6 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200R (11 December 2009); doi: 10.1117/12.837341
Show Author Affiliations
K. Subramanya Mayya, Samsung Electronics Co., Ltd. (Korea, Republic of)
Yool Kang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Kyung Hee Univ. (Korea, Republic of)
Takahiro Yasue, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seok-Hwan Oh, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (Korea, Republic of)
Chan-Hoon Park, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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