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Proceedings Paper

Study of OPC accuracy by illumination source types
Author(s): Kiho Yang; Daejin Park; Jeonkyu Lee; Sangjin Oh; Jinhyuck Jeon; Taejun You; Chanha Park; Donggyu Yim; Sungki Park
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Paper Abstract

The study of OPC (Optical Proximity Correction) model that well predict the wafer result has been researched. As the pattern design shrink down, the need for the CD (Critical Dimension) controllability increased more than before. To achieve these requirements, OPC models must be accurate for full chip process and model inaccuracies are one of several factors which contribute to errors in the final wafer image. For that reason, robust OPC using real lithographic terms was proposed. Real lithographic system is quite different from ideal system that is used for OPC modeling. Until now, this difference was acceptable since pattern size used for OPC model was large, but as device size shrinks, this gap between ideal and real system causes degradation of OPC accuracy. So, various optical parameters such as apodization, laser band width, degree of polarization, illumination are used today in order to compensate for this issue. Especially, major issue in modeling error is related to how the illumination source is used. For this study we assess accuracy of optical model for robust OPC using ideal and actual illumination sources, and test conditions are as follows: 1) We examined the difference of pupil types to output model respectively; 2) A parameterized test pattern layout was used by 1D test pattern types that have various lines and spaces; 3) All models were calculated in automation method so as to exclude the dependency of user skills; 4) OPC accuracies were examined by gate layer patterns on full chip level. The study is performed for 5X~4Xnm nodes lithographic processes. The main focus of the study was on usability of model that is made by measured source data in semiconductor manufacturing. Results clearly showed that the actual source for the optical model has merits and demerits.

Paper Details

Date Published: 14 December 2009
PDF: 8 pages
Proc. SPIE 7520, Lithography Asia 2009, 75202A (14 December 2009); doi: 10.1117/12.837224
Show Author Affiliations
Kiho Yang, Hynix Semiconductor Inc. (Korea, Republic of)
Daejin Park, Hynix Semiconductor Inc. (Korea, Republic of)
Jeonkyu Lee, Hynix Semiconductor Inc. (Korea, Republic of)
Sangjin Oh, Hynix Semiconductor Inc. (Korea, Republic of)
Jinhyuck Jeon, Hynix Semiconductor Inc. (Korea, Republic of)
Taejun You, Hynix Semiconductor Inc. (Korea, Republic of)
Chanha Park, Hynix Semiconductor Inc. (Korea, Republic of)
Donggyu Yim, Hynix Semiconductor Inc. (Korea, Republic of)
Sungki Park, Hynix Semiconductor Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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