Share Email Print

Proceedings Paper

Mask defect specification in the spacer patterning process by using a fail-bit-map analysis
Author(s): Seiro Miyoshi; Shinji Yamaguchi; Masato Naka; Keiko Morishita; Takashi Hirano; Hiroyuki Morinaga; Hiromitsu Mashita; Ayumi Kobiki; Makoto Kaneko; Hidefumi Mukai; Minori Kajimoto; Takashi Sugihara; Yoshiyuki Horii; Yoshihiro Yanai; Tadahito Fujisawa; Kohji Hashimoto; Soichi Inoue
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We obtained the acceptable mask defect size for both opaque and clear defects in the spacer patterning process using the fail-bit-map analysis and a mask with programmed defects. The spacer patterning process consists of the development of photoresist film, the etching of the core film using the photoresist pattern as the etching mask, the deposition of a spacer film on both sides of the core film pattern, and the removal of the core film. The pattern pitch of the spacer film becomes half that of the photoresist. Both the opaque defect and the clear defect of the mask resulted in a short defect in the spacer pattern. From the fail-bit-map analysis, the acceptable mask defect size for opaque and clear defects was found to be 80nm and 120nm, respectively, which could be relaxed from that in ITRS2008. The difference of the acceptable mask defect size for opaque and clear defects comes from the difference of the defect printability at the resist development.

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 752014 (11 December 2009); doi: 10.1117/12.837132
Show Author Affiliations
Seiro Miyoshi, Toshiba Corp. (Japan)
Shinji Yamaguchi, Toshiba Corp. (Japan)
Masato Naka, Toshiba Corp. (Japan)
Keiko Morishita, Toshiba Corp. (Japan)
Takashi Hirano, Toshiba Corp. (Japan)
Hiroyuki Morinaga, Toshiba Corp. (Japan)
Hiromitsu Mashita, Toshiba Corp. (Japan)
Ayumi Kobiki, Toshiba Corp. (Japan)
Makoto Kaneko, Toshiba Corp. (Japan)
Hidefumi Mukai, Toshiba Corp. (Japan)
Minori Kajimoto, Toshiba Corp. (Japan)
Takashi Sugihara, Toshiba Corp. (Japan)
Yoshiyuki Horii, Toshiba Corp. (Japan)
Yoshihiro Yanai, Toshiba Corp. (Japan)
Tadahito Fujisawa, Toshiba Corp. (Japan)
Kohji Hashimoto, Toshiba Corp. (Japan)
Soichi Inoue, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top