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Proceedings Paper

End-to-end statistical process/device/circuit/system design
Author(s): M. Krasikov; V. Nelayev; V. Syakerckii; V. Stempitsky
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Paper Abstract

In this paper we present a methodology for the end-to-end statistical process/device/circuit/system analysis and optimization. We use standard software at the every design stage when ordinary design procedure is performed. But approximated dependencies, which were obtained through the use of response surface methodology, are used to conduct statistical analysis in Monte-Carlo loop for investigation of influence of process parameters deviation on output process/device/circuit/system performances. A rudimentary simple example of the cell inverter design, formed on the basis of the MOS-transistor, illustrates the efficiency of the methodology.

Paper Details

Date Published: 17 June 2009
PDF: 6 pages
Proc. SPIE 7377, Twelfth International Workshop on Nanodesign Technology and Computer Simulations, 737715 (17 June 2009); doi: 10.1117/12.837070
Show Author Affiliations
M. Krasikov, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
V. Nelayev, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
V. Syakerckii, Research and Production Corp. Integral (Belarus)
V. Stempitsky, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)


Published in SPIE Proceedings Vol. 7377:
Twelfth International Workshop on Nanodesign Technology and Computer Simulations
Alexander I. Melker; Vladislav V. Nelayev, Editor(s)

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