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Proceedings Paper

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)
Author(s): Takanori Kudo; Srinivasan Chakrapani; Alberto Dioses; Edward Ng; Charito Antonio; Deepa Parthasarathy; Shinji Miyazaki; Yuki Ubayashi; Kazuma Yamamoto; Yasushi Akiyama; Richard Collett; Mark Neisser; Munirathna Padmanaban
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Paper Abstract

Developable bottom anti-reflective coatings (DBARC) are an emerging litho material technology. The biggest advantage of DBARC is that it eliminates the plasma etch step, avoiding damage to plasma sensitive layers during implantation. AZ has pioneered developable BARC based on photosensitive cleave as well as crosslink/decrosslink mechanisms. In this paper, we focus on the crosslink/decrosslink concept. DBARC/resist mismatching was corrected both from process and formulation sides. The optimized DBARC showed comparable lithographic performance as conventional BARCs. This paper provides the chemical concept of the photosensitive developable DBARCs, approaches for DBARC/resist matching and performance of photosensitive DBARCs for 248 nm and 193 nm exposures. Recent 193 nm immersion exposure results are also presented.

Paper Details

Date Published: 11 December 2009
PDF: 11 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200N (11 December 2009); doi: 10.1117/12.837050
Show Author Affiliations
Takanori Kudo, AZ Electronic Materials USA Corp. (United States)
Srinivasan Chakrapani, AZ Electronic Materials USA Corp. (United States)
Alberto Dioses, AZ Electronic Materials USA Corp. (United States)
Edward Ng, AZ Electronic Materials USA Corp. (United States)
Charito Antonio, AZ Electronic Materials USA Corp. (United States)
Deepa Parthasarathy, AZ Electronic Materials USA Corp. (United States)
Shinji Miyazaki, AZ Electronic Materials Japan K.K. (Japan)
Yuki Ubayashi, AZ Electronic Materials Japan K.K. (Japan)
Kazuma Yamamoto, AZ Electronic Materials Japan K.K. (Japan)
Yasushi Akiyama, AZ Electronic Materials Japan K.K. (Japan)
Richard Collett, AZ Electronic Materials USA Corp. (United States)
Mark Neisser, AZ Electronic Materials USA Corp. (United States)
Munirathna Padmanaban, AZ Electronic Materials USA Corp. (United States)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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