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Proceedings Paper

Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system
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Paper Abstract

E-Reticle system is an electrostatic field test device, which has the form factor of a conventional six inch quartz production reticle. The E-Reticle was used to assess the ESD damage risks in a mask cleaning tool. Test results indicate that a reticle may see higher than ITRS recommended electrostatic potential specifications when mechanical operations and cold DIW rinse start and in progress, hence seeing increased probability of electrostatic induced damages.

Paper Details

Date Published: 11 December 2009
PDF: 10 pages
Proc. SPIE 7520, Lithography Asia 2009, 752015 (11 December 2009); doi: 10.1117/12.837039
Show Author Affiliations
Richard Tu, Benchmark Technologies Inc. (United States)
Thomas Sebald, Estion GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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