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Proceedings Paper

Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems
Author(s): Melchior Mulder; André Engelen; Oscar Noordman; Robert Kazinczi; Gert Streutker; Bert van Drieenhuizen; Stephen Hsu; Keith Gronlund; Markus Degünther; Dirk Jürgens; Johannes Eisenmenger; Michael Patra; Andras Major
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Paper Abstract

This paper describes the principle and performance of a fully programmable illuminator for a high-NA immersion system. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. All mirrors are always used to create the source such that no light is lost when switching from one source shape to another. Measured sources generated with this new type of illumination system will be shown and compared to the target sources generated by source mask optimization software or targets of traditional sources. Comparison between measured and target source will be done both in parameters of a pupil fit model and by simulated imaging impact. Also the first results in resist obtained on a XTIV 1950Hi 1.35 NA tool equipped with this illuminator are presented and compared to measurements on the same system when it was equipped with an Aerial XP illumination system.

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200Y (11 December 2009); doi: 10.1117/12.837035
Show Author Affiliations
Melchior Mulder, ASML Netherlands B.V. (Netherlands)
André Engelen, ASML Netherlands B.V. (Netherlands)
Oscar Noordman, ASML Netherlands B.V. (Netherlands)
Robert Kazinczi, ASML Netherlands B.V. (Netherlands)
Gert Streutker, ASML Netherlands B.V. (Netherlands)
Bert van Drieenhuizen, ASML Netherlands B.V. (Netherlands)
Stephen Hsu, ASML Brion Technologies, Inc. (United States)
Keith Gronlund, ASML Brion Technologies, Inc. (United States)
Markus Degünther, Carl Zeiss SMT AG (Germany)
Dirk Jürgens, Carl Zeiss SMT AG (Germany)
Johannes Eisenmenger, Carl Zeiss SMT AG (Germany)
Michael Patra, Carl Zeiss SMT AG (Germany)
Andras Major, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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