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Proceedings Paper

Ultrafast photoluminescence as a diagnostic for laser damage initiation
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Paper Abstract

Using high-sensitivity confocal time-resolved photoluminescence (CTP) techniques, we report an ultra-fast photoluminescence (40ps-5ns) from impurity-free surface flaws on fused silica, including polished, indented or fractured surfaces of fused silica, and from laser-heated evaporation pits. This fast photoluminescence (PL) is not associated with slower point defect PL in silica which has characteristic decay times longer than 5ns. Fast PL is excited by the single photon absorption of sub-band gap light, and is especially bright in fractures. Regions which exhibit fast PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5eV ns-scale laser pulses, making CTP a powerful non-destructive diagnostic for laser damage in silica. The use of CTP to provide insights into the nature of damage precursors and to help develop and evaluate new damage mitigation strategies will be presented.

Paper Details

Date Published: 31 December 2009
PDF: 11 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750416 (31 December 2009); doi: 10.1117/12.836923
Show Author Affiliations
Ted A. Laurence, Lawrence Livermore National Lab. (United States)
Jeff D. Bude, Lawrence Livermore National Lab. (United States)
Nan Shen, Lawrence Livermore National Lab. (United States)
Phillip E. Miller, Lawrence Livermore National Lab. (United States)
William A. Steele, Lawrence Livermore National Lab. (United States)
Gabe Guss, Lawrence Livermore National Lab. (United States)
John J. Adams, Lawrence Livermore National Lab. (United States)
Lana L. Wong, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Tayyab I. Suratwala, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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