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Proceedings Paper

Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films
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Paper Abstract

In this contribution we will summarize the fundamental mechanisms that lead to subpicosecond laser damage in dielectric films, discuss the resulting scaling laws of single pulse (1-on-1) damage with respect to pulse duration and bandgap, of the multiple pulse (S-on-1) damage threshold as a function of pulse number, and compare these findings to recent experimental results.

Paper Details

Date Published: 31 December 2009
PDF: 10 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040P (31 December 2009); doi: 10.1117/12.836508
Show Author Affiliations
L. A. Emmert, The Univ. of New Mexico (United States)
D. N. Nguyen, The Univ. of New Mexico (United States)
M. Mero, The Univ. of New Mexico (United States)
W. Rudolph, The Univ. of New Mexico (United States)
D. Ristau, Laser Zentrum Hannover e.V. (Germany)
K. Starke, Laser Zentrum Hannover e.V. (Germany)
M. Jupé, Laser Zentrum Hannover e.V. (Germany)
C. S. Menoni, Colorado State Univ. (United States)
D. Patel, Colorado State Univ. (United States)
E. Krous, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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