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Proceedings Paper

Subpicosecond pulse laser damage behavior of dielectric thin films prepared by different techniques
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Paper Abstract

A new instrument dedicated to laser damage measurement in subpicosecond scale has been developed at the Fresnel Institute (3 ps to 100 fs, 1030 nm). The objective of this work is to realize a comparative study of the behavior of hafnia thin films prepared by different techniques (Reactive Low Voltage Ion Plating, Electron Beam Deposition, Dual Ion Beam Sputtering) under subpicosecond pulse irradiation in the near infra red. Laser-induced damage thresholds are measured for one-on-one procedures. Laser damage setup and first results at 1 ps are presented and initiation mechanisms are studied thanks to damage morphologies and optical properties characterization. Results show a dependence of damage threshold with deposition techniques and so with microstructure of the film.

Paper Details

Date Published: 31 December 2009
PDF: 9 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040Q (31 December 2009); doi: 10.1117/12.836500
Show Author Affiliations
B. Mangote, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
L. Gallais, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
M. Commandré, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
M. Zerrad, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
J. Y. Natoli, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
M. Lequime, Institut Fresnel, CNRS, Univ. Aix Marseille (France)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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