Share Email Print
cover

Proceedings Paper

Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses
Author(s): Andrius Melninkaitis; Arturas Vaninas; Julius Mirauskas; Kestutis Kuršelis; Ona Balachninaite; Valdas Sirutkaitis
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Experimental investigation of the laser conditioning efficiency by nanosecond pulses at 266 and 355 nm in high reflectivity mirrors used in optical parametric oscillators (OPOs) is present in this report. The high reflection coatings were deposited on the fused silica substrates. The materials used for e-beam coating deposition were ZrO2 and SiO2. Laser conditioning was investigated as function of number of pulses, wavelength and conditioning protocol. Ramped-fluence pre-exposure was used as a method to explore optimal improvement to the damage performance at 266 and 355 nm. No conditioning effect was observed using nanosecond pulses at 266 nm, but the mirror conditioning with 355 nm pulses increased the laser-induced damage threshold (LIDT) by 2.5-3 times. The experimental results support the concept that the laser conditioning effect observed in high quality optical thin films is associated with intrinsic electronic defects in the films.

Paper Details

Date Published: 31 December 2009
PDF: 6 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750408 (31 December 2009); doi: 10.1117/12.836496
Show Author Affiliations
Andrius Melninkaitis, Vilnius Univ. (Lithuania)
Arturas Vaninas, Vilnius Univ. (Lithuania)
Julius Mirauskas, Vilnius Univ. (Lithuania)
Kestutis Kuršelis, Vilnius Univ. (Lithuania)
Ona Balachninaite, Vilnius Univ. (Lithuania)
Valdas Sirutkaitis, Vilnius Univ. (Lithuania)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

© SPIE. Terms of Use
Back to Top