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Proceedings Paper

Impact of outgassing organic contamination on laser induced damage of optics
Author(s): K. Bien-Aimé; A. Pereira; C. Belin; L. Gallais; P. Grua; I. Tovena-Pecault; J. Néauport; E. Fargin
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Paper Abstract

The impact of molecular contamination on the lifetime of fused silica UV optics used in high power laser facility is studied. In our particular case corresponding to Laser MégaJoule (LMJ) beams, the irradiation conditions are a fluence higher than 10 J/cm2 at a wavelength of 351 nm (3 ω) for 3 ns pulse duration and a single shot/day frequency. A confine environment, a long period of exposition and proximity of the optical components with outgassing materials are critical parameters for the optics contamination. Consequently, experiments were performed in the UV section of the Ligne d'Intégration Laser (LIL), actual prototype of the LMJ. Moreover, the optics storage conditions were studied. Indeed, to ensure an efficient replacement of the optics on the laser bundle, many optical components are fabricated long before. They are stored during months in polypropylene frames put in containers. Then, we intentionally contaminated silica samples with one sort of polypropylene. We evidenced an important increase of laser induced damage density on samples contaminated by both bundle and storage environments. Surface analyses have been used to identify the potential causes of this effect. Various hypotheses of damage mechanisms are proposed.

Paper Details

Date Published: 31 December 2009
PDF: 9 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040V (31 December 2009); doi: 10.1117/12.836384
Show Author Affiliations
K. Bien-Aimé, CEA (France)
A. Pereira, CEA (France)
C. Belin, UMR 5255, ISM-CNRS (France)
L. Gallais, Institut Fresnel, CNRS, Univ. Aix Marseille (France)
P. Grua, CEA (France)
I. Tovena-Pecault, CEA (France)
J. Néauport, CEA (France)
E. Fargin, UMR 5255, ISM-CNRS (France)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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