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Proceedings Paper

Laser-induced damage thresholds in silica glasses at different temperature
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Paper Abstract

The laser-induced damage thresholds in silica glasses at different temperature conditions (123 K - 473 K) by Nd:YAG laser fundamental (wavelength 1064 nm) and third harmonic (wavelength 355 nm) 4 ns of pulses were measured. In the results, the damage thresholds increased at low temperature. At 1064 nm, the temperature dependence became strong by the concentration of impurities. However, at 355 nm, the temperature dependences of almost sample were almost the same for different concentration of impurities.

Paper Details

Date Published: 31 December 2009
PDF: 5 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75041R (31 December 2009); doi: 10.1117/12.836350
Show Author Affiliations
K. Mikami, Osaka Univ. (Japan)
S. Motokoshi, Institute for Laser Technology (Japan)
M. Fujita, Institute for Laser Technology (Japan)
T. Jitsuno, Osaka Univ. (Japan)
J. Kawanaka, Osaka Univ. (Japan)
R. Yasuhara, Hamamatsu Photonics K. K (Japan)


Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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