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Proceedings Paper

Advanced proximity matching with pattern matcher
Author(s): Alexander Serebryakov; Lionel Brige; Emmanuel Boisseau; Eric Peloquin; Vincent Coutellier; Jonathan Planchot
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Paper Abstract

In a semiconductor factory, each lithographic scanner is combined with a laser source and a track to form a lithocell. Quite frequently, lithographers have to deal with running the same lithographic process on multiple lithocells. Usually a new process is developed for one cell, and then transferred to other cells. However, small but non-negligible differences between lithocells, may result in yield losses. Nevertheless, several scanner's parameters (called proximity manipulators) can be used to compensate for these differences and match the secondary lithocells to the reference one. Recently a new advanced process matching methodology called Pattern Matcher has been developed. Using this method, we performed successful proximity matching of several ArF scanners in the production environment. In this paper, we discuss the principles of Pattern Matcher approach as well as methodology for data acquisition and present results of our matching.

Paper Details

Date Published: 27 May 2009
PDF: 9 pages
Proc. SPIE 7470, 25th European Mask and Lithography Conference, 747013 (27 May 2009); doi: 10.1117/12.835203
Show Author Affiliations
Alexander Serebryakov, ASML Netherlands B.V. (Netherlands)
Lionel Brige, ASML Netherlands B.V. (Netherlands)
Emmanuel Boisseau, STMicroelectronics (France)
Eric Peloquin, STMicroelectronics (France)
Vincent Coutellier, STMicroelectronics (France)
Jonathan Planchot, STMicroelectronics (France)


Published in SPIE Proceedings Vol. 7470:
25th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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