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Proceedings Paper

Innovative processes investigation for photomask pod conditioning and drying
Author(s): J. M. Foray; C. Rude; J. Palisson; M. Davenet; A. Favre; D. Cheung; F. Dufaye; S. Gough; P. Richteiger; V. Baudiquez; E. Foca; P. Nesladek; S. Gopalakrishnan; K. Avary; I. Höllein
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Paper Abstract

Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essential to measure, to understand and then try to reduce AMC in mask environment. Results and assessment of mask pod environment in term of molecular contamination was presented in a first step (11). Then in second step further studies was carried out within European CRYSTAL project in order to reduce mask pod influence and contamination due to material out gassing. Results are shown here. These studies were carried out in the frame of the European R&D project, the so called "CRYSTAL" project, focusing on photomask defect reduction.

Paper Details

Date Published: 27 May 2009
PDF: 6 pages
Proc. SPIE 7470, 25th European Mask and Lithography Conference, 747010 (27 May 2009); doi: 10.1117/12.835198
Show Author Affiliations
J. M. Foray, Alcatel Vacuum Technology (France)
C. Rude, Alcatel Vacuum Technology (France)
J. Palisson, Alcatel Vacuum Technology (France)
M. Davenet, Alcatel Vacuum Technology (France)
A. Favre, Alcatel Vacuum Technology (France)
D. Cheung, Entegris Cleaning Process SAS (France)
F. Dufaye, STMicroelectronics (France)
S. Gough, STMicroelectronics (France)
P. Richteiger, Dynamic Micro Systems (Germany)
V. Baudiquez, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
E. Foca, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
P. Nesladek, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
S. Gopalakrishnan, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
K. Avary, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
I. Höllein, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)


Published in SPIE Proceedings Vol. 7470:
25th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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