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Proceedings Paper

Residual-free imprint for sensor definition
Author(s): A. Mayer; N. Bogdanski; S. Möllenbeck; H.-C. Scheer
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Paper Abstract

For the preparation of interdigitated sensor devices with nanometre sized electrodes a low-cost route is followed. The central technique used for electrode definition is nanoimprint. To imprint the larger contact areas as easy as the electrodes, the contacts are broken down into a grid. In order to end up with a highly uniform residual layer the concept of 'partial cavity filling' is utilised, resulting in an almost negligible layer thickness. The metallic electrodes are defined by sputtering and lift-off directly after imprint, where a previous etching of the residual layer is not required. The results show that the concept works. With this strategy, preparation of an interdigitated sensor requires nothing but spin-coating, nanoimprinting and sputtering/lift-off.

Paper Details

Date Published: 27 May 2009
PDF: 9 pages
Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700K (27 May 2009); doi: 10.1117/12.835182
Show Author Affiliations
A. Mayer, Univ. of Wuppertal (Germany)
N. Bogdanski, Univ. of Wuppertal (Germany)
S. Möllenbeck, Univ. of Wuppertal (Germany)
H.-C. Scheer, Univ. of Wuppertal (Germany)

Published in SPIE Proceedings Vol. 7470:
25th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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