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Proceedings Paper

Micro-motion exposure method based on PZT piezoelectric ceramics
Author(s): Wenjun Sun; Mei-heng Zhang; Zhong Meng
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Paper Abstract

There mainly is laser digital photofinishing technique and digital photofinishing technique based on LCD consisting of TFT and LCOS in the digital photofinishing field at the present time. The former have a good many merit such as wide color gamut, high processing rate, large output size and high brightness, but his cost is very high, his maintain technique being comparatively complex, that result in difficult use for people. The utilization ratio of the latter is low because of lower resolution and lower aperture ratio for LCD, but the digital photofinishing based on LCD have lower cost and higher utilization ration, being suitable for people's current standard of living. Considering above mentioned problem, a micro-motion exposure method based on PZT piezoelectric ceramics used in digital image photofinishing is presented. The two-dimension micro-motion exposure system consisting of PZT piezoelectric ceramics, LCD panel, polarizing film and spring strip is designed. By means of PZT piezoelectric ceramics the LCD panel is removed about the one half of the pixel size of the LCD panel for four times from the original place, at the same time imaging system is exposed four times at the printing paper. The software is used to control the time synchronization, the exposure time and motion range of the LCD panel. The system has advantages such as shorter response time than 0.1seconds, lesser motion error than 0.01 microns, high stability and repeatability. Experimental results show that the proposed micro-motion exposure method improve the picture brightness and enlarge output size, at the meantime reducing the cost of the system.

Paper Details

Date Published: 24 August 2009
PDF: 7 pages
Proc. SPIE 7381, International Symposium on Photoelectronic Detection and Imaging 2009: Material and Device Technology for Sensors, 73810D (24 August 2009); doi: 10.1117/12.834827
Show Author Affiliations
Wenjun Sun, Harbin Normal Univ. (China)
Mei-heng Zhang, Mudanjiang Teachers College (China)
Zhong Meng, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7381:
International Symposium on Photoelectronic Detection and Imaging 2009: Material and Device Technology for Sensors
Xu-yuan Chen; Yue-lin Wang; Zhi-ping Zhou; Qing-kang Wang, Editor(s)

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