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Proceedings Paper

AFM characterization of large area micro-optical elements
Author(s): M. Oliva; T. Benkenstein; M. Flemming; U. D. Zeitner
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Paper Abstract

We discuss AFM (Atomic Force Microscopy) characterization in terms of critical dimension and depth for large area micro-optical elements. Results are shown and discussed in comparison with other techniques, such as SEM (Scanning Electron Microscopy) for CD measurements and FIB (Focused Ion Beam)-SEM characterization for the structure profile.

Paper Details

Date Published: 17 June 2009
PDF: 7 pages
Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73893K (17 June 2009); doi: 10.1117/12.834223
Show Author Affiliations
M. Oliva, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
T. Benkenstein, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
M. Flemming, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
U. D. Zeitner, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 7389:
Optical Measurement Systems for Industrial Inspection VI
Peter H. Lehmann, Editor(s)

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