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Proceedings Paper

Sub-resolution assist features placement using cost-function-reduction method
Author(s): Jinyu Zhang; Wei Xiong; Yan Wang; Zhiping Yu; Min-Chun Tsai
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Paper Abstract

We proposed a new method of generating and optimizing sub-resolution assist features (SRAFs). This method is based on a newly proposed ILT algorithm-Cost-function-Reduction method (CFRM). CFRM is proved to be much effective and efficient than gradient-based algorithm and traditional simulated annealing method. We improve CFRM to be an initial condition independent algorithm (ICIA) by tuning some running parameters. The robustness of ICIA is verified numerically by six mask patterns and two mask technologies in partial-coherence image model using 100 randomly generated mask patterns. Results showed that all are converged to similar final mask patterns with less than 3% differences of the final image edge placement error (EPE). The skeleton of the final mask pattern can be decided by first tens of iterations. Based on the above properties, an efficient and effective algorithm is proposed to handle SRAFs placement. This effectiveness method is demonstrated by different patterns using different mask technologies.

Paper Details

Date Published: 23 September 2009
PDF: 12 pages
Proc. SPIE 7488, Photomask Technology 2009, 748811 (23 September 2009); doi: 10.1117/12.834099
Show Author Affiliations
Jinyu Zhang, Tsinghua Univ. (China)
Wei Xiong, Tsinghua Univ. (China)
Yan Wang, Tsinghua Univ. (China)
Zhiping Yu, Tsinghua Univ. (China)
Min-Chun Tsai, Brion Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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