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Proceedings Paper

Very low amplified spontaneous emission threshold from a molecular host-guest energy transfer system and electroluminescence from light-emitting diode structure
Author(s): Stefano Toffanin; Raffaella Capelli; Gianluca Generali; Tsyr-Yuan Hwu; Ken-Tsung Wong; Roberto Zamboni; Michele Muccini
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Paper Abstract

We report on the characteristics of a host-guest lasing system obtained by co-evaporation of an oligo(9,9-diarylfluorene) derivative named T3 with the red-emitter 4-(dicyanomethylene)-2-methyl-6-(p-dimethylaminostyryl)-4H-pyran dye (DCM). We demonstrate that the ambipolar semiconductor T3 can be implemented as active matrix in the realization of a host-guest system in which an efficient energy transfer takes place from T3 matrix to the lasing DCM molecules. We performed a spectroscopic study on the system by systematically varying the DCM concentration in the T3 matrix. Measurements of steady-state photoluminescence (PL), PL quantum yield (PLQY) and amplified spontaneous emission (ASE) threshold are used to optimize the acceptor concentration at which the ASE from DCM molecules takes place with the lowest threshold. Organic light-emitting diodes (OLEDs) implementing the DCM:T3 host-guest system as recombination layer are fabricated for verifying the optical properties of the optimised blend in real working devices. Indeed, the very low ASE threshold of T3:DCM makes the investigated blend an appealing system for use as active layer in lasing devices. In particular, the ambipolar charge transport properties of the T3 matrix and its field-effect characteristics make the host-guest system presented here an ideal candidate for the realization of electrically-pumped organic lasers.

Paper Details

Date Published: 2 October 2009
PDF: 10 pages
Proc. SPIE 7487, Optical Materials in Defence Systems Technology VI, 748703 (2 October 2009); doi: 10.1117/12.833639
Show Author Affiliations
Stefano Toffanin, CNR, Istituto per lo Studio dei Materiali Nanostrutturati (Italy)
Raffaella Capelli, CNR, Istituto per lo Studio dei Materiali Nanostrutturati (Italy)
Gianluca Generali, CNR, Istituto per lo Studio dei Materiali Nanostrutturati (Italy)
Tsyr-Yuan Hwu, National Taiwan Univ. (Taiwan)
Ken-Tsung Wong, National Taiwan Univ. (Taiwan)
Roberto Zamboni, CNR, Istituto per lo Studio dei Materiali Nanostrutturati (Italy)
Michele Muccini, CNR, Istituto per lo Studio dei Materiali Nanostrutturati (Italy)


Published in SPIE Proceedings Vol. 7487:
Optical Materials in Defence Systems Technology VI
James G. Grote; François Kajzar; Roberto Zamboni, Editor(s)

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