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Proceedings Paper

OPC model calibration and parameter optimization for 3D complex patterns using scatterometry data
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Proc. SPIE 7488, Photomask Technology 2009, 748839; doi: 10.1117/12.833501
Show Author Affiliations
Oleg Kritsun, GLOBALFOUNDRIES Inc. (United States)
Aasutosh Dave, Mentor Graphics Corp. (United States)
Yunfei Deng, GLOBALFOUNDRIES Inc. (United States)
Jie Li, Nanometrics Inc. (United States)
Jiangtao Hu, Nanometrics Inc. (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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