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Proceedings Paper

Duplicated quartz template for 2.5 inch discrete track media
Author(s): Noriko Yamashita; Tadashi Oomatsu; Satoshi Wakamatsu; Katsuhiro Nishimaki; Toshihiro Usa; Kazuyuki Usuki
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Paper Abstract

The Nano Imprint Lithography (NIL) process has been proposed as a method of making Discrete Track Media (DTM) for the next generation hard disc. The UV-NIL process is especially practical because of its minimal thermal expansion and high manufacturing throughput. Quartz template fabrication is a key issue in UV-NIL. Duplication from a Si master using NIL was studied as a method of such quartz template fabrication. In this method, the UV light radiated through the quartz substrate to reach the resist. This method avoids typically used Cr (and other hard masks) on the quartz substrate, eliminating the problem of low throughput caused by low transmission efficiency of the hard mask. The success of this method therefore depends crucially on the etching selectivity of quartz to NIL resist used as the resist mask. Using a newly developed NIL resist with high etching selectivity and duplicating by a "hard mask-less" method, a 125nm track pitch (TP), 2.5 inch full-surface quartz template with uniform pattern height was fabricated. A 75nm TP quartz template of 60nm pattern height was also fabricated using this method.

Paper Details

Date Published: 23 September 2009
PDF: 9 pages
Proc. SPIE 7488, Photomask Technology 2009, 74880W (23 September 2009); doi: 10.1117/12.833466
Show Author Affiliations
Noriko Yamashita, FUJIFILM Corp. (Japan)
Tadashi Oomatsu, FUJIFILM Corp. (Japan)
Satoshi Wakamatsu, FUJIFILM Corp. (Japan)
Katsuhiro Nishimaki, FUJIFILM Corp. (Japan)
Toshihiro Usa, FUJIFILM Corp. (Japan)
Kazuyuki Usuki, FUJIFILM Corp. (Japan)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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