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Proceedings Paper

6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists
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Paper Abstract

Nanoimprint lithography (NIL) is one promising candidate for fabricating a patterned media to be used in the next generation of hard disk drives. It is expected that the pitch, characterizing the feature size of the media will become as small as about 50 nm for discrete-track recording (DTR) in 2010 or 2011. There are two major issues, one is fine groove formation and the other is long e-beam writing time. Writing time is estimated more than one week if we use ZEP520A-resist. To solve these problems, master template fabrication processes using combination of silicon substrate and new CAR were evaluated. As a result, the capability of 1:2 groove and land ratio 50 nm pitch LS pattern formation with new CAR which sensitivity is approximately 2.5 times higher than ZEP520A was shown.

Paper Details

Date Published: 29 September 2009
PDF: 8 pages
Proc. SPIE 7488, Photomask Technology 2009, 74881S (29 September 2009); doi: 10.1117/12.833449
Show Author Affiliations
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Fukuda, Dai Nippon Printing Co., Ltd. (Japan)
Tsuyoshi Chiba, Dai Nippon Printing Co., Ltd. (Japan)
Mikio Ishikawa, Dai Nippon Printing Co., Ltd. (Japan)
Kimio Itoh, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Nobuhito Toyama, DNP Corp. USA (United States)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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