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Proceedings Paper

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond
Author(s): Isao Yonekura; Hidemitsu Hakii; Keishi Tanaka; Masaru Higuchi; Yoshiaki Ogiso; Toshihide Oba; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura
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Paper Abstract

In order to analyze small reticle defects quantitatively, we have developed a function to measure differences in two patterns using contour data extracted from SEM images. This function employs sub-pixel contour data extracted with high accuracy to quantify a slight difference by ΔCD and ΔArea. We assessed the measurement uncertainty of the function with a test mask and compared the sizes of programmed defects by each of conventional and proposed methods. We have also investigated a correlation between measured minute defects in high MEEF (Mask Error Enhancement Factor) regions and aerial images obtained by AIMS (Aerial Image Measurement System) tool. In this paper, we will explain the Contour Comparison Measurement function jointly developed by Toppan and Advantest and will show its effectiveness for photomask defect analyses.

Paper Details

Date Published: 23 September 2009
PDF: 12 pages
Proc. SPIE 7488, Photomask Technology 2009, 748831 (23 September 2009); doi: 10.1117/12.833405
Show Author Affiliations
Isao Yonekura, Toppan Printing Co., Ltd. (Japan)
Hidemitsu Hakii, Toppan Printing Co., Ltd. (Japan)
Keishi Tanaka, Toppan Printing Co., Ltd. (Japan)
Masaru Higuchi, Toppan Printing Co., Ltd. (Japan)
Yoshiaki Ogiso, Advantest Corp. (Japan)
Toshihide Oba, Advantest Corp. (Japan)
Toshimichi Iwai, Advantest Corp. (Japan)
Jun Matsumoto, Advantest Corp. (Japan)
Takayuki Nakamura, Advantest Corp. (Japan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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