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Proceedings Paper

Challenging defect repair techniques for maximizing mask repair yield
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Paper Abstract

In today's economic climate it is critical to improve mask yield as materials, processes and tools are more time and cost involved than ever. One way to directly improve mask yield is by reducing the number of masks scrapped due to defects which is one of the major mask yield reducing factors. The MeRiTTM MG 45, with the ability to repair both clear and opaque defects on a variety of masks, is the most comprehensive and versatile repair tool in production today. The cost of owning multiple repair tools can be reduced and time is saved when fast turnaround is required, especially when more than one defect type is present on a single mask. This paper demonstrates the ability to correct repair errors due to human mistakes and presents techniques to repair challenging production line defects with the goal of maximizing mask repair yield and cycle time reduction.

Paper Details

Date Published: 23 September 2009
PDF: 8 pages
Proc. SPIE 7488, Photomask Technology 2009, 74880H (23 September 2009); doi: 10.1117/12.833404
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMT Inc. (United States)
Jens Oster, NaWoTec GmbH (Germany)
Markus Waiblinger, Carl Zeiss SMS GmbH (Germany)
Klaus Edinger, NaWoTec GmbH (Germany)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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