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Proceedings Paper

Examination about observation of the identical position of a mask and silicon
Author(s): Ryoichi Matsuoka; Hiroaki Mito; Yoshihiro Ota; Yasutaka Toyoda
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Proc. SPIE 7488, Photomask Technology 2009, 74883D; doi: 10.1117/12.833403
Show Author Affiliations
Ryoichi Matsuoka, Hitachi High Technologies Corp. (Japan)
Hiroaki Mito, Hitachi High Technologies Corp. (Japan)
Yoshihiro Ota, Hitachi High Technologies Corp. (Japan)
Yasutaka Toyoda, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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