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Proceedings Paper

The theoretical analysis of tri-beam SPPs interference through Ag film
Author(s): Fengze Jin; Jinglei Du; Yongkang Guo; Lifang Shi; Chunlei Du
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Paper Abstract

Through combination of multi-beam coherent SPPs which are excited by p-polarized wide light which illuminates the interface between prism and metal with resonance angle for interference exposure with, and optimizes exposal parameter of interference lithography, we can obtain high differentiate and high contrast of periodicity nanometer structure by using SPPs of shortwave and near field with enhanced. In this paper,we set up interferential model of SPPs using equation groups of Maxwell below Kretschmann structure, and simulate SPPs interferns and receive nanometer lattice and discuss the influence of refractive index of prism and resist .The method is suitable for fabricating nanometer photonic crystal and deep sub-micrometer periodic patterns in large field size used in opto-eletronical components and it can effectively debase got-up cost.

Paper Details

Date Published: 18 May 2009
PDF: 5 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840M (18 May 2009); doi: 10.1117/12.832081
Show Author Affiliations
Fengze Jin, Sichuan Univ. (China)
Institute of Optics and Electronics (China)
Jinglei Du, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Lifang Shi, Institute of Optics and Electronics (China)
Chunlei Du, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)

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