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Proceedings Paper

Imaging characterization and tolerance analysis of thin planar photon sieves
Author(s): Zhifeng Chen; Chinhua Wang; Hong Qu
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Paper Abstract

The effects of various design and fabrication parameters on the imaging characteristics of a photon sieve are analyzed. Specifically, the focusing characteristics on the focal plane of photon sieves with different arrangement of pinholes in terms of shape, orientation and angle of incidence were investigated using professional optical design software ZEMAX for the first time, which is otherwise difficult to calculate by the exact theory. The fabrication tolerances of different parameters of the photon sieves were evaluated using Monte-Carlo method.

Paper Details

Date Published: 18 May 2009
PDF: 5 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840J (18 May 2009); doi: 10.1117/12.832077
Show Author Affiliations
Zhifeng Chen, Soochow Univ. (China)
Chinhua Wang, Soochow Univ. (China)
Hong Qu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems

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