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Proceedings Paper

Study on laser direct writing system for 32nm node
Author(s): Wenbo Jiang; Song Hu; Yong Yang; Lixin Zhao; Wei Yan; Shaolin Zhou; Wangfu Chen
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Paper Abstract

In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized.

Paper Details

Date Published: 18 May 2009
PDF: 6 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840C (18 May 2009); doi: 10.1117/12.832070
Show Author Affiliations
Wenbo Jiang, Institute of Optics and Electronics (China)
Graduate School of the CAS (China)
Song Hu, Institute of Optics and Electronics (China)
Yong Yang, Institute of Optics and Electronics (China)
Graduate School of the CAS (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Wei Yan, Institute of Optics and Electronics (China)
Shaolin Zhou, Institute of Optics and Electronics (China)
Graduate School of the CAS (China)
Wangfu Chen, Institute of Optics and Electronics (China)
Graduate School of the CAS (China)


Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)

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