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Proceedings Paper

Optimizing attaching area in an ultrathin active mirror system
Author(s): Bin Xie; Ying Ni
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Paper Abstract

Ultra-thin mirror often is used in active optics and adaptive optics. To maintain its surface, activators are used. Many factors are important including how much area should the attaching area be. A simplified deformation model was established considering mirrors' practical using. It would deform linearly outside attaching area and keep no change within attaching area. In this model, aspherical error is a key factor. Using zernike polynomials, the relationship between attaching area and surface error introduce by activator is established. At last, finite element method is used to testify theoretical analysis. It proves to be reasonable that decrease the ratio of attaching area and activator's controlling area. To decrease stiff concentration, the ratio should be about 1/10.

Paper Details

Date Published: 5 May 2009
PDF: 4 pages
Proc. SPIE 7281, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 72810D (5 May 2009); doi: 10.1117/12.831437
Show Author Affiliations
Bin Xie, Soochow Univ. (China)
Ying Ni, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 7281:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes
Wenhan Jiang; Roland Geyl; Myung K. Cho; Fan Wu, Editor(s)

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