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Proceedings Paper

Results of an international photomask linewidth comparison of NIST and PTB
Author(s): B. Bodermann; D. Bergmann; E. Buhr; W. Hässler-Grohne; H. Bosse; J. Potzick; R. Dixson; R. Quintanilha; M. Stocker; A. Vladar; N. G. Orji
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Paper Abstract

In preparation for the international Nano1 linewidth comparison on photomasks between nine national metrology institutes, the National Institute of Standards and Technology (NIST) and the Physikalisch-Technische Bundesanstalt (PTB), initiated a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This paper reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.

Paper Details

Date Published: 23 September 2009
PDF: 14 pages
Proc. SPIE 7488, Photomask Technology 2009, 74881H (23 September 2009); doi: 10.1117/12.831373
Show Author Affiliations
B. Bodermann, Physikalisch-Technische Bundesanstalt (Germany)
D. Bergmann, Physikalisch-Technische Bundesanstalt (Germany)
E. Buhr, Physikalisch-Technische Bundesanstalt (Germany)
W. Hässler-Grohne, Physikalisch-Technische Bundesanstalt (Germany)
H. Bosse, Physikalisch-Technische Bundesanstalt (Germany)
J. Potzick, National Institute of Standards and Technology (United States)
R. Dixson, National Institute of Standards and Technology (United States)
R. Quintanilha, National Institute of Standards and Technology (United States)
M. Stocker, National Institute of Standards and Technology (United States)
A. Vladar, National Institute of Standards and Technology (United States)
N. G. Orji, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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