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Proceedings Paper

Athermal design of hybrid refractive/harmonic diffractive optical system for far-infrared multi-band
Author(s): Ying Liu; Qiang Sun; Zhenwu Lu; Jinying Yue; Hu Zhang; Rui Zhu
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Paper Abstract

In order to get enough information about the target, avoid big chromatic aberration as a result of wide spectrum and the complexity of optical system and adapt different special environment temperature, a hybrid refractive/ harmonic diffractive optical system in far-infrared multi-band is described in the paper. This diffractive optical system has been designed an athermalized multi-band imaging system with harmonic diffractive element in 15-50μm spectrum, based on larger 1dispersion capability and particular thermal dispersive power of harmonic diffractive element. Then, at the temperature range from 0°C to 40°C, this design can simultaneously meet with all requirements of the imaging system in five harmonic wave bands, including15.8-16.2μm, 18.5-20μm, 23-25μm, 30.5-33.5μm and 46-50μm. In each harmonic wave band, the magnification changes as a function of wavelength, which creates image registration error. To compensate this shortcoming, a zoom optical system is designed with three lenses by means of optical two- component method. The design results show that the hybrid refractive/harmonic diffractive optical system can realize athermalized and achromatic design, and the zoom optical system makes half image height at 3.53mm in every harmonic wave band and still realizes aberration compensation action. In the five harmonic wave bands, each optical transfer function approaches the diffraction limit at ambient temperature range of 0°C to 40°C. Finally, the system realizes the requirements of portability, mini-type and ease for fabrication.

Paper Details

Date Published: 20 May 2009
PDF: 9 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72823Q (20 May 2009); doi: 10.1117/12.831069
Show Author Affiliations
Ying Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Qiang Sun, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Zhenwu Lu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jinying Yue, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Hu Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Rui Zhu, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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