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Proceedings Paper

Simulation of substrate temperature in HFCVD diamond thin films
Author(s): Yongjie Wang; Huijuan Wang; Zengqian Yin
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Paper Abstract

The substrate temperature is one of the most important parameters for the synthesis of high quality diamond thin films in hot filament chemical vapor deposition (HFCVD) system. Based on the principle of heat transfer, the substrate temperature is calculated in the single hot filament system, the influence of filament height, filament diameter and filament length on substrate temperature are also discussed. Results show that the substrate temperatures vary with the space position. In the direction of parallel with the filament, the substrate temperatures vary smoothly, but, in the vertical direction of the filament, the substrate temperatures change acutely. When H=8mm, L=7cm and df=0.5mm, the substrate temperatures are well-distributed, this will give the support of some technique parameters for the growth of large area HFCVD diamond thin films.

Paper Details

Date Published: 21 May 2009
PDF: 4 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72822O (21 May 2009); doi: 10.1117/12.830994
Show Author Affiliations
Yongjie Wang, North China Electric Power Univ. (China)
Huijuan Wang, North China Electric Power Univ. (China)
Zengqian Yin, North China Electric Power Univ. (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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