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Proceedings Paper

Ultraprecision finishing process integrated ELID grinding and MRF for BK glass
Author(s): Shaohui Yin; Hitoshi Ohmori; Yoshihiro Uehara; Yongjian Zhu; Fengjun Chen; Kejun Zhu
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Paper Abstract

An ultra-precision synergistic finishing process integrated MRF and ELID grinding was proposed for shorten total finishing time and improve finishing quality. Sets of ultra-precision experiments were carried out to grind and finish some optical glass BK materials. ELID grinding, as pre-finishing, was employed to obtain high efficiency and high surface quality; and then, MRF, as the final finishing, was employed to improve further surface roughness and form accuracy. BK13 plane glass was processed by integrated ELID grinding using #4000 wheel and MRF. After ELID grinding, λ/5 P-V was obtained, and then, MRF 30 minutes, the form accuracy was improved to λ/28 P-V. Likewise, curvature BK7 glass lens was also used to test. After ELID grinding using #4000 wheel, form accuracy λ/5 P-V and surface roughness 261 nm rms were obtained; and then, MRF 17 minutes (2 cycles), the form accuracy and the surface micro-roughness were improved to λ/18 P-V and 0.56 nm rms. By applying the ultra-precision synergistic finishing process of ELID-grinding and MRF, the glass materials could be finished to sub-nanometer surface micro roughness and ~20 nm figure accuracy in a short time.

Paper Details

Date Published: 20 May 2009
PDF: 4 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72821X (20 May 2009); doi: 10.1117/12.830891
Show Author Affiliations
Shaohui Yin, Hunan Univ. (China)
Hitoshi Ohmori, RIKEN (Japan)
Yoshihiro Uehara, RIKEN (Japan)
Yongjian Zhu, Hunan Univ. (China)
Fengjun Chen, Hunan Univ. (China)
Kejun Zhu, Hunan Univ. (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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