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Proceedings Paper

Optical and electrochemical properties of the protonic state electrochromic device: NiOx/Ta2O5/WO3-x
Author(s): Zhuying Li; Liu Ye; Minliang Zhang; Chonglou Shun
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Paper Abstract

In the present investigation, the electrochromic properties of a protonic solid state device: WO3 / Ta2O5 / NiOx prepared at room temperature (300K) is reported. The non-stoichiometric tungsten oxide thin film (100nm), the tantalum oxide thin film (360nm) and the nickel oxide thin film (50nm) are prepared by RF magnetron sputtering technique on ITO coated glass; The transmittance variation for Li+ device is +30% and for Ta+ device is -2%. The optical band gap for WO3 film is 3.11eV, for WO3 / Ta2O5 / NiOx multilayer films is 2.98eV.

Paper Details

Date Published: 20 May 2009
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728217 (20 May 2009); doi: 10.1117/12.830861
Show Author Affiliations
Zhuying Li, Naval Univ. of Engineering (China)
Liu Ye, Naval Univ. of Engineering (China)
Minliang Zhang, Naval Univ. of Engineering (China)
Chonglou Shun, Naval Univ. of Engineering (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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